Oblique Colloidal Lithography for the Fabrication of Nonconcentric Features

4 years ago

Oblique Colloidal Lithography for the Fabrication of Nonconcentric Features

Ximin He, Peter Nordlander, Jian Yang, Yang Cao, Zhi Zhao, Paul S. Cremer, Yangjun Cai

Herein, we describe the development of oblique colloidal lithography (OCL) and establish a systematic patterning strategy for creating libraries of nanosized nonconcentric plasmonic structures. This strategy combines OCL, capillary force lithography, and several wet and ion etching steps. Hexagonal arrays of nonconcentric gold features were created on glass substrates with highly controllable geometric parameters. The size, geometry, and eccentricity of the gold features could be independently tuned by controlling the experimental conditions. Gaps within surface elements could be shrunk to as small as 30 nm, while the total patterned area was about l cm². The goal was to devise a method that offers a high degree of control over the resolution and morphology of asymmetric structures without the need to resort to electron beam lithography. This technique also enabled the development of numerous surface patterns through the stepwise fabrication of separate elements. Complex features, including dots-surrounded nonconcentric targets, nonconcentric hexagram-disks, and nonconcentric annular aperture arrays, were demonstrated, and their optical properties were characterized. Indeed, spectroscopic studies and FDTD simulations demonstrated that Fano resonances could readily be generated by the nonconcentric gold features. Consequently, our patterning strategy should enable the high-throughput investigation of plasmonic coupling and Fano resonances as a function of the physical parameters of the elements within the nanopattern array.

Publisher URL: http://dx.doi.org/10.1021/acsnano.6b07867

DOI: 10.1021/acsnano.6b07867