3 years ago

Enhanced Quality CVD-Grown Graphene via a Double-Plateau Copper Surface Planarization Methodology

Enhanced Quality CVD-Grown Graphene via a Double-Plateau Copper Surface Planarization Methodology
Travis M. Tumlin, Tomoko Sano, Derek Demaree, Joshua T. Smith, Christos Dimitrakopoulos, Satoshi Oida, Mark H. Griep
The influence of CVD growth substrate morphology toward as-synthesized graphene electrical properties is explored through this work. It is demonstrated that ultrasmooth Cu growth substrates yield a substantial improvement in graphene transport properties, with a direct correlation between Cu surface roughness levels and subsequent graphene carrier mobility values being shown.

Publisher URL: http://dx.doi.org/10.1021/acs.cgd.7b00687

DOI: 10.1021/acs.cgd.7b00687

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