3 years ago

Low-Temperature Ohmic Contact to Monolayer MoS2 by van der Waals Bonded Co/h-BN Electrodes

Low-Temperature Ohmic Contact to Monolayer MoS2 by van der Waals Bonded Co/h-BN Electrodes
Baichang Li, Xu Cui, Luis A. Jauregui, Ji-Hoon Park, Takashi Taniguchi, Kenji Watanabe, Young Hee Lee, Cory R. Dean, Young Duck Kim, Dongjea Seo, En-Min Shih, Jun Yin, Philip Kim, Heon-Jin Choi, Sang Hoon Chae, James C. Hone, Kateryna Pistunova
Monolayer MoS2, among many other transition metal dichalcogenides, holds great promise for future applications in nanoelectronics and optoelectronics due to its ultrathin nature, flexibility, sizable band gap, and unique spin-valley coupled physics. However, careful study of these properties at low temperature has been hindered by an inability to achieve low-temperature Ohmic contacts to monolayer MoS2, particularly at low carrier densities. In this work, we report a new contact scheme that utilizes cobalt (Co) with a monolayer of hexagonal boron nitride (h-BN) that has the following two functions: modifies the work function of Co and acts as a tunneling barrier. We measure a flat-band Schottky barrier of 16 meV, which makes thin tunnel barriers upon doping the channels, and thus achieve low-T contact resistance of 3 kΩ.μm at a carrier density of 5.3 × 1012/cm2. This further allows us to observe Shubnikov–de Haas oscillations in monolayer MoS2 at much lower carrier densities compared to previous work.

Publisher URL: http://dx.doi.org/10.1021/acs.nanolett.7b01536

DOI: 10.1021/acs.nanolett.7b01536

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