4 years ago

Atomic Layer Deposition of Aluminum Sulfide: Growth Mechanism and Electrochemical Evaluation in Lithium-Ion Batteries

Atomic Layer Deposition of Aluminum Sulfide: Growth Mechanism and Electrochemical Evaluation in Lithium-Ion Batteries
Joseph A. Libera, Xiangbo Meng, Yanqiang Cao, Jeffrey W. Elam
This study describes the synthesis of aluminum sulfide (AlSx) thin films by atomic layer deposition (ALD) using tris(dimethylamido)aluminum and hydrogen sulfide. We employed a suite of in situ measurement techniques to explore the ALD AlSx growth mechanism, including quartz crystal microbalance, quadrupole mass spectrometry, and Fourier transform infrared spectroscopy. A variety of ex situ characterization techniques were used to determine the growth characteristics, morphology, elemental composition, and crystallinity of the resultant AlSx films. This study revealed that the AlSx growth was self-limiting in the temperature range 100–250 °C, and the growth per cycle decreased linearly with increasing temperature from ∼0.45 Å/cycle at 100 °C to ∼0.1 Å/cycle at 250 °C. The AlSx films were amorphous in this temperature range. We conducted electrochemical testing to evaluate the ALD AlSx as a potential anode material for lithium-ion batteries (LIBs). The ALD AlSx exhibited reliable cyclability over 60 discharge–charge cycles with a sustainable discharge capacity of 640 mAh/g at a current density of 100 mA/g in the voltage window of 0.6–3.5 V.

Publisher URL: http://dx.doi.org/10.1021/acs.chemmater.7b02175

DOI: 10.1021/acs.chemmater.7b02175

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