3 years ago

Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space

Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space
Joel K. W. Yang, Arseniy I. Kuznetsov, Ye Feng Yu, Yuan Hsing Fu, Sihao Wang, Ramón Paniagua-Dominguez, Jinfa Ho, Zhaogang Dong
Localized optical resonances in metallic nanostructures have been increasingly used in color printing, demonstrating unprecedented resolution but limited in color gamut. Here, we introduce a new nanostructure design, which broadens the gamut while retaining print resolution. Instead of metals, silicon nanostructures that exhibit localized magnetic and electric dipole resonances were fabricated on a silicon substrate coated with a Si3N4 index matching layer. Index matching allows a suppression of substrate effects, thus enabling Kerker’s conditions to be met, that is, sharpened transitions in the reflectance spectra leading to saturated colors. This nanostructure design achieves a color gamut superior to sRGB, and is compatible with CMOS processes. The presented design could enable compact high-resolution color displays and filters, and the use of a Si3N4 antireflection coating can be readily extended to designs with nanostructures fabricated using other high-index materials.

Publisher URL: http://dx.doi.org/10.1021/acs.nanolett.7b03613

DOI: 10.1021/acs.nanolett.7b03613

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