Switching Mechanism and the Scalability of vertical-TFETs.
In this work, vertical tunnel field-effect transistors (v-TFETs) based on vertically stacked hereto-structures from 2D transition metal dichalcogenide (TMD) materials are studied by atomistic quantum transport simulations. The switching mechanism of v-TFET is found to be different from previous predictions. As a consequence of this switching mechanism, the extension region, where the materials are not stacked over is found to be critical for the v-TFET for turning off. This extension region makes the scaling of v-TFETs challenging. In addition, due to the presence of both positive and negative charges inside the channel, v-TFET also exhibits negative capacitance. As a result, v-TFETs have good energy-delay product and is one of the promising candidates for low power applications
Publisher URL: http://arxiv.org/abs/1711.01832
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