Angewandte Chemie - International Edition
Angewandte Chemie - International Edition
5 years ago

Use of Supramolecular Assemblies as Lithographic Resists

Use of Supramolecular Assemblies as Lithographic Resists
Hayden R. Alty, Fredrik Schedin, Matthew S. Hunt, George F. S. Whitehead, Antonio Fernandez, Guy A. DeRose, Sarah Varey, Andreas K. Kostopoulos, Grigore A. Timco, Richard E. P. Winpenny, Axel Scherer, Scott M. Lewis, Agnese Lagzda, Jesus Ferrando-Soria, Christopher A. Muryn, Stephen G. Yeates
A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high-resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas. A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Based on this supramolecular approach, high-resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.

Publisher URL: http://onlinelibrary.wiley.com/resolve/doi

DOI: 10.1002/anie.201700224

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