5 years ago

Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae
XiaoMin Yang, Christopher J. Ellison, Yasunobu Someya, Akhila Mallavarapu, Yusuke Asano, Gregory Blachut, Austin P. Lane, C. Grant Willson, Michael J. Maher, Stephen M. Sirard
The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high etch selectivity. Reactive ion etching was used to selectively remove the PVBD block, and fingerprint patterns were subsequently transferred into an underlying chromium hard mask and carbon layer. DSA of the block copolymer (BCP) features resulted from orienting PVBD-b-PDSS on guidelines patterned by nanoimprint lithography. A density multiplication factor of 4× was achieved through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS) was used to analyze the BCP profile in the DSA samples. Wetting layers of parallel orientation were observed to form unless the bottom and top surface were neutralized with a surface treatment and top coat, respectively.

Publisher URL: http://dx.doi.org/10.1021/acsnano.7b02698

DOI: 10.1021/acsnano.7b02698

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