3 years ago

Additive dependent synthesis of bismuth oxybromide composites for photocatalytic removal of the antibacterial agent ciprofloxacin and mechanism insight

Additive dependent synthesis of bismuth oxybromide composites for photocatalytic removal of the antibacterial agent ciprofloxacin and mechanism insight
Zhaodi Xu, Xiaofeng Gong, Yiqun Wan, Xiaoxing Zeng
Bismuth oxybromide composites obtained with TEOA as additive exhibit the highest photocatalytic degradation for CIP under visible light irradiation.

Publisher URL: http://feeds.rsc.org/~r/rss/ra/~3/LygS2ipPCuc/C7RA05213H

DOI: 2017/RA/C7RA05213H

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