3 years ago

Extreme ultraviolet resist materials for sub-7 nm patterning

Extreme ultraviolet resist materials for sub-7 nm patterning
Christopher K. Ober, Li Li, Emmanuel P. Giannelis, Xuan Liu, Shulan Wang, Shyam Pal
Continuous ongoing development of dense integrated circuits requires significant advancements in nanoscale patterning technology.

Publisher URL: http://feeds.rsc.org/~r/rss/CS/~3/zSPQCPSjNhg/C7CS00080D

DOI: 2017/CS/C7CS00080D

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