3 years ago

Spatially varying aberration calibration using a pair of matched periodic pinhole array masks

Yifeng Shao, Mikhail Loktev, Ying Tang, Florian Bociort, H. Paul Urbach
For advanced imaging systems, e.g., projection systems for optical lithography, spatially varying aberration calibration is of utmost importance to achieve uniform imaging performance over the entire field-of-view (FOV). Here we present an efficient, accurate, and robust spatially varying ...

Publisher URL: http://www.osapublishing.org/abstract.cfm

DOI: oe-27-2-729

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