3 years ago

Thiophene-Alkyne-Based CMPs as Highly Selective Regulators for Oxidative Heck Reaction

Thiophene-Alkyne-Based CMPs as Highly Selective Regulators for Oxidative Heck Reaction
Zong-Cang Ding, Ren-Hao Li, Xiao-Ming An, Cun-Yao Li, Zhuang-Ping Zhan, Jun-Jia Chen, Yun-Jie Ding, Yun-Bing Zhou
Thiophenes containing an adjacent C≡C group as ligands for PdII-promoted organic reactions are reported for the first time. These ligands were utilized as catalytic sites and integrated into the skeleton of conjugated microporous polymers. By employing these CMP materials as selective regulators, oxidative Heck reactions between arylboronic esters and electronically unbiased alkenes provide highly selective linear products.

Publisher URL: http://dx.doi.org/10.1021/acs.orglett.7b01858

DOI: 10.1021/acs.orglett.7b01858

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