3 years ago

Large area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons

Zeyu Zhao, Yunfei Luo, Chengwei Zhao, Weijie Kong, Changtao Wang, Ping Gao, Hongchao Liu, Mingbo Pu, Kaipeng Liu, Xiangang Luo, Wenjuan Du
Interference lithography is an important method for fabricating periodical nano-structures. Its resolution, however, is limited with the minimum period being half the wavelength of light due to the diffraction limit. In this study, we presented bulk plasmon polariton (BPP) interference lithography ...

Publisher URL: http://www.osapublishing.org/abstract.cfm

DOI: 10.1364/OME.8.000199

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