Lin-Bing Sun, Zhi-Min Wang, Xiao-Qin Liu, Lin Zhang, Shi-Chao Qi, Zheng-Zhong Kang
Owing to the rigid standards of manufacturing semiconductor components, decrease of the moisture to parts-per-billion (ppb), at a global level, is always vital but extremely nerve-racking in the production of high-purity gases. Herein, typical adsorbents including oxides (SiO2 and γ-Al2O3), zeolites (4A and NaX), and metal–organic frameworks (MOFs; HKUST-1, UiO-66, and ZIF-8) are investigated with respect to the abilities of ultradeep dewatering from N2. Compared with other adsorbents, NaX performs much better on both dewatering efficiency (DE, from 2750 to 66 ppb) and the adsorption capacity (AC, 1.55 × 104 L N2·g–1). Moreover, it is for the first time experimentally and theoretically proved that the dewatering ability of X zeolite mainly depends on its cation species (Na+, Li+, K+, Cs+, Mg2+, Ca2+, Sr2+, or Ba2+), the forces between the zeolite and H2O, and the number of H2O molecules per cell of the zeolite. CaX thus shows a fascinating DE from 2750 to 33 ppb, a huge AC of 9.08 × 104 L N2·g–1, and an ideal reusability, compared with results of the scarce contributions reported to date.