3 years ago

Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning

Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning
Keon Jae Lee, Gil Yong Lee, Dae Yong Park, Kwang Ho Kim, Joonwon Lim, Ju Young Kim, Seong-Jun Jeong, Hyeong Min Jin, Seung Keun Cha, Sang Ouk Kim, Jeong Ho Mun, Jun Soo Kim
One of the fundamental challenges encountered in successful incorporation of directed self-assembly in sub-10 nm scale practical nanolithography is the process compatibility of block copolymers with a high Flory–Huggins interaction parameter (χ). Herein, reliable, fab-compatible, and ultrafast directed self-assembly of high-χ block copolymers is achieved with intense flash light. The instantaneous heating/quenching process over an extremely high temperature (over 600 °C) by flash light irradiation enables large grain growth of sub-10 nm scale self-assembled nanopatterns without thermal degradation or dewetting in a millisecond time scale. A rapid self-assembly mechanism for a highly ordered morphology is identified based on the kinetics and thermodynamics of the block copolymers with strong segregation. Furthermore, this novel self-assembly mechanism is combined with graphoepitaxy to demonstrate the feasibility of ultrafast directed self-assembly of sub-10 nm nanopatterns over a large area. A chemically modified graphene film is used as a flexible and conformal light-absorbing layer. Subsequently, transparent and mechanically flexible nanolithography with a millisecond photothermal process is achieved leading the way for roll-to-roll processability. Wafer-scale millisecond level directed self-assembly of high-χ block copolymers (BCPs) are successfully demonstrated by photothermal effect of achromatic flash light. Milliseconds-duration extremely high-temperature (≈600 °C) process near the order–disorder transition temperature (TODT) of high-χ BCPs enables extraordinary grain growth without noticeable thermal degradation even in atmospheric conditions.

Publisher URL: http://onlinelibrary.wiley.com/resolve/doi

DOI: 10.1002/adma.201700595

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