Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3

5 years ago

Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3

P. M. Vereecken, W. M. M. Kessels, B. Put, N. Hornsveld, M. Creatore

Growth per cycle as a function of process table temperature for both plasma-assisted (squares) and thermal (circles) ALD processes.

Publisher URL: http://feeds.rsc.org/~r/rss/ra/~3/yKfLtb-fkCE/C7RA07722J

DOI: 2017/RA/C7RA07722J

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