Selective Chemical Response of Transition Metal Dichalcogenides and Metal Dichalcogenides in Ambient Conditions

4 years ago

Selective Chemical Response of Transition Metal Dichalcogenides and Metal Dichalcogenides in Ambient Conditions

Suresh Vishwanath, Xinyu Liu, Jun Hong Park, Joshua A. Robinson, Mary Edmonds, Iljo Kwak, Andrew C. Kummel, Huili Grace Xing, Jacek Furdyna, Michael Breeden, Kehao Zhang, Margaret Dobrowolska, Steven Wolf

To fabricate practical devices based on semiconducting two-dimensional (2D) materials, the source, channel, and drain materials are exposed to ambient air. However, the response of layered 2D materials to air has not been fully elucidated at the molecular level. In the present report, the effects of air exposure on transition metal dichalcogenides (TMD) and metal dichalcogenides (MD) are studied using ultrahigh-vacuum scanning tunneling microscopy (STM). The effects of a 1-day ambient air exposure on MBE-grown WSe₂, chemical vapor deposition (CVD)-grown MoS₂, and MBE SnSe₂ are compared. Both MBE-grown WSe₂ and CVD-grown MoS₂ display a selective air exposure response at the step edges, consistent with oxidation on WSe₂ and adsorption of hydrocarbon on MoS₂, while the terraces and domain/grain boundaries of both TMDs are nearly inert to ambient air. Conversely, MBE-grown SnSe₂, an MD, is not stable in ambient air. After exposure in ambient air for 1 day, the entire surface of SnSe₂ is decomposed to SnO_x and SeO_x, as seen with X-ray photoelectron spectroscopy. Since the oxidation enthalpy of all three materials is similar, the data is consistent with greater oxidation of SnSe₂ being driven by the weak bonding of SnSe₂.

Publisher URL: http://dx.doi.org/10.1021/acsami.7b08244

DOI: 10.1021/acsami.7b08244