Influence of oxygen pressure on the fs laser-induced oxidation of molybdenum thin films

5 years ago

Influence of oxygen pressure on the fs laser-induced oxidation of molybdenum thin films

Marco Camacho-López, Santiago Camacho-López, Guillermo Aguilar, Kendrick Mensink, Jon Redenius, Natanael Cuando-Espitia

We present a study of femtosecond (1028 nm, 230 fs, 54.7 MHz) laser processing on molybdenum (Mo) thin films. Irradiations were done under ambient air as well as pure oxygen (O_2) at various gauge pressures (4, 8, 12 and 16 psi). Our results indicate that the high heating rates associated with ...

Publisher URL: http://www.osapublishing.org/abstract.cfm

DOI: ome-8-3-581

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