Non-contact XUV metrology of Ru/B_4C multilayer optics by means of Hartmann wavefront analysis

5 years ago

Non-contact XUV metrology of Ru/B_4C multilayer optics by means of Hartmann wavefront analysis

Philippe Zeitoun, Lu Li, Davide Bleiner, Mabel Ruiz-Lopez, Magali Lozano, Hugo Dacasa, Benoit Mahieu

Short-wavelength imaging, spectroscopy, and lithography scale down the characteristic length-scale to nanometers. This poses tight constraints on the optics finishing tolerances, which is often difficult to characterize. Indeed, even a tiny surface defect degrades the reflectivity and spatial ...

Publisher URL: http://www.osapublishing.org/abstract.cfm

DOI: ao-57-6-1315

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