Advanced Materials
Advanced Materials
4 years ago

Characterization of Edge Contact: Atomically Resolved Semiconductor–Metal Lateral Boundary in MoS2

Characterization of Edge Contact: Atomically Resolved Semiconductor–Metal Lateral Boundary in MoS2
Hyo Won Kim, Hyangsook Lee, Euyheon Hwang, Insu Jeon, Hwansoo Suh, Jin-Wook Jung, Samudrala Appalakondaiah, Youngtek Oh, Hongki Min, Sungwoo Hwang, Jinseong Heo, Hyeokshin Kwon, Wonhee Ko, Kiyoung Lee
Despite recent efforts for the development of transition-metal-dichalcogenide-based high-performance thin-film transistors, device performance has not improved much, mainly because of the high contact resistance at the interface between the 2D semiconductor and the metal electrode. Edge contact has been proposed for the fabrication of a high-quality electrical contact; however, the complete electronic properties for the contact resistance have not been elucidated in detail. Using the scanning tunneling microscopy/spectroscopy and scanning transmission electron microscopy techniques, the edge contact, as well as the lateral boundary between the 2D semiconducting layer and the metalized interfacial layer, are investigated, and their electronic properties and the energy band profile across the boundary are shown. The results demonstrate a possible mechanism for the formation of an ohmic contact in homojunctions of the transition-metal dichalcogenides semiconductor–metal layers and suggest a new device scheme utilizing the low-resistance edge contact. The edge contact and the lateral boundary between a semiconducting layer and a metalized interfacial layer are investigated using scanning tunneling microscopy/spectroscopy and scanning transmission electron microscopy techniques. The electronic properties and the energy band profile across the boundary are shown. A new device scheme based on the low-resistance edge contact is thus provided.

Publisher URL: http://onlinelibrary.wiley.com/resolve/doi

DOI: 10.1002/adma.201702931

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