3 years ago

Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial

Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial
Xi Chen, Fan Yang, L. Jay Guo, Qiaochu Li, Cheng Zhang, Gaofeng Liang
In this work, a special hyperbolic metamaterial (HMM) metamaterial is investigated for plasmonic lithography of period reduction patterns. It is a type II HMM (ϵ < 0 and ϵ > 0) whose tangential component of the permittivity ϵ is close to zero. Due to the high anisotropy of the type II epsilon-near-zero (ENZ) HMM, only one plasmonic mode can propagate horizontally with low loss in a waveguide system with ENZ HMM as its core. This work takes the advantage of a type II ENZ HMM composed of aluminum/aluminum oxide films and the associated unusual mode to expose a photoresist layer in a specially designed lithography system. Periodic patterns with a half pitch of 58.3 nm were achieved due to the interference of third-order diffracted light of the grating. The lines were 1/6 of the mask with a period of 700 nm and ∼1/7 of the wavelength of the incident light. Moreover, the theoretical analyses performed are widely applicable to structures made of different materials such as silver as well as systems working at deep ultraviolet wavelengths including 193, 248, and 365 nm.

Publisher URL: http://dx.doi.org/10.1021/acsnano.7b03584

DOI: 10.1021/acsnano.7b03584

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